|
|
|
Introduction to Focused Ion Beams is geared towards techniques and applications. This is the only text that discusses and presents the theory directly related to applications and the only one that discusses the vast applications and techniques used in FIBs and dual platform instruments.
| ISBN | 0387231161 | | Pages | 378 | | ISBN13 | 9780387231167
(What's this?) | | Volumes | 1 | | Publisher | Springer-Verlag New York Inc. | | Weight (grammes) | 706 | | Imprint | Springer-Verlag New York Inc. | | Published in | New York, NY | | Format | Hardback | | Height (mm) | 234 | | Publication date | 07 Jan 2005 | | Width (mm) | 156 | | Library of Congress | 2004056559 | | Spine width (mm) | 22 | | DEWEY | 539.7 | | Academic level | Postgraduate, Professional / Scholarly | | DEWEY edition | DC22 | |
|
| |
| 1 | | The focused ion beam instrument by F. A. Stevie and L. A. Giannuzzi and B. I. Prenitzer | | 1 | | 2 | | Ion - solid interactions by L. A. Giannuzzi and B. I. Prenitzer and B. W. Kempshall | | 13 | | 3 | | Focused ion beam gases for deposition and enhanced etch by F. A. Stevie and D. P. Griffis and P. E. Russell | | 53 | | 4 | | Three-dimensional nanofabrication using focused ion beams by T. Kaito | | 73 | | 5 | | Device edits and modifications by K. N. Hooghan | | 87 | | 6 | | The uses of dual beam FIB in microelectronic failure analysis by B. Holdford | | 107 | | 7 | | High resolution live imaging of FIB milling processes for optimum accuracy by P. Gnauck and P. Hoffrogge and M. Schumann | | 133 | | 8 | | FIB for materials science applications - a review by M. W. Phaneuf | | 143 | | 9 | | Practical aspects of FIB TEM specimen preparation by R. Anderson and S. J. Klepeis | | 173 | | 10 | | FIB lift-out specimen preparation techniques by L. A. Giannuzzi and B. W. Kempshall and S. M. Schwarz and J. K. Lomness and B. I. Prenitzer and F. A. Stevie | | 201 | | 11 | | A FIB micro-sampling technique and a site specific TEM specimen preparation method by T. Kamino and T. Yaguchi and T. Hashimoto and T. Ohnishi and K. Umemura | | 229 | | 12 | | Dual-beam (FIB-SEM) systems by R. J. Young and M. V. Moore | | 247 | | 13 | | Focused ion beam secondary ion mass spectrometry (FIB-SIMS) by F. A. Stevie | | 269 | | 14 | | Quantitative three-dimensional analysis using focused ion beam microscopy by D. N. Dunn and A. J. Kubis and R. Hull | | 281 | | 15 | | Application of FIB in combination with Auger electron spectroscopy by E. L. Principe | | 301 | | App. A | | Ga ion sputter yields | | 329 | | App. B | | Backsputtered Ga ion fraction | | 333 | | App. C | | 30 keV Ga ion range at 0 degrees | | 337 | | App. D | | 30 keV Ga ion range at 88 degrees | | 341 | | | More... | | |
|
|
|
|
|
Enlarge
