This monograph provides detailed information on the principles, instrumentation, and application of X-ray diffraction at elevated temperatures. More particularly, it summarizes the uses of intense X-ray sources and position-sensitive detectors to assess them in comparison with competing techniques for in situ process analysis at elevated temperatures. This book is intended for use in the training of personnel and in the promotion of the process. Within the areas of X-ray diffraction, materials characterization and thermal analysis, it should be of interest to crystallographers, thermal analysts, materials scientists, physicists, chemists, chemical engineers, and electrical engineers.
| ISBN | 3527278427 | | Library of Congress | QC482.D5 X | | ISBN13 | 9783527278428
(What's this?) | | Pages | 272 | | Publisher | Wiley-VCH Verlag GmbH | | Published in | Weinheim | | Imprint | Wiley-VCH Verlag GmbH | | Height (mm) | 235 | | Format | Hardback | | Width (mm) | 155 | | Publication date | 23 Mar 1993 | | Academic level | Postgraduate, Professional / Scholarly |
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Review of X-ray diffraction; X-ray diffraction at elevated temperatures using intense X-ray sources; X-ray diffraction at elevated temperatures using position-sensitive detectors; instrumentation of X-ray diffraction at elevated temperatures; in situ process analysis at elevated temperatures; applications of X-ray diffraction at elevated temperatures; kinetic study using X-ray diffraction at elevated temperatures.
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