ISBN: 9783527278428 - X-Ray Diffraction at Elevated Temperatures Earn 65 points
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X-Ray Diffraction at Elevated Temperatures

A Method for in Situ Process Analysis

Deborah D.L. Chung, et al

ISBN: 9783527278428
Format: Hardback
Publisher: John Wiley and Sons Ltd

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Provides information on the principles, instrumentation, and application of X-ray diffraction at elevated temperatures. It summarizes the uses of intense X-ray sources and position-sensitive detectors to assess them in comparison with competing techniques. More

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This monograph provides detailed information on the principles, instrumentation, and application of X-ray diffraction at elevated temperatures. More particularly, it summarizes the uses of intense X-ray sources and position-sensitive detectors to assess them in comparison with competing techniques for in situ process analysis at elevated temperatures. This book is intended for use in the training of personnel and in the promotion of the process. Within the areas of X-ray diffraction, materials characterization and thermal analysis, it should be of interest to crystallographers, thermal analysts, materials scientists, physicists, chemists, chemical engineers, and electrical engineers.